Demonstration Day

Program Tuesday 24 October

This Demonstration Day is especially for guests of the Conference on October 23. We will visit Fraunhofer Institutes for Laser Technology ILT and Production Technology as well as the Digital Photonic Production research campus. In small groups of maximum 10 people we will visit the mentioned locations and speakers.

10.00 – 12.00 hrs : Visit locations
12.00 – 13.00 hrs : Lunch
13.00 – 15.00 hrs : Visit locations
15.00 – 16.00 hrs : Visit Research Campus Digital Photonic Production

This day is for free, including coffee/tea and lunch offered by Fraunhofer Institute. The maximum number of guest is 50. Registration is required.

Digitalization of the precision blank molding processes
Jan-Helge Staasmeyer

In order to promote and advance transition to digitalization and adaptivity in the field of replicative optics manufacturing, the Fraunhofer IPT has elaborated an innovative and comprehensive data solution concept, which has been implemented within the precision glass molding process (PGM). In a specially equipped glass molding machine, tailored sensor systems are collecting multiple data, concerning the molding process, such as temperature, force and pressure profiles. This information is acquired in real time and serves the purpose of immediate visualization and the reconstruction of the manufactured component as digital twin with live simulation tools.

On isothermal glass molding of optical components
Paul-Alexander Vogel

On the contrary to conventional grinding and polishing techniques, the blank molding process of glass allows the manufacturing of complex geometries and even micro structured functional surfaces in just one process step. Due to the short cycle times and the absence of any post-processing the blank molding process is highly suitable for serial and mass production of optical glass components.

Roll2roll production of multi-functional optical thin films
Martin Priwisch

Light weight components, mobile user devices and displays require highly integrated functional elements. Optical thin films provide a suitable technology to realize smart solutions for a spectrum of applications in the field of opto- electronics and micro-fluidics, often replacing conventional components. Printed electronics, lab-on-a-chip-systems and biomedical nano-structures can be manufactured in a continuously roll-to-roll process – a scalable and highly efficient technology.

Generative manufacturing of arbitrary optical structures
Emely Harnisch

The manufacturing of optical structures by conventional methods such as diamond turning or grey tone lithography limits the geometrical properties of the corresponding structures. 3D laser lithography utilizing two photon polymerization overcomes these limitations by writing arbitrary geometries into photosensitive polymers. In this way, optimized beam shaping characteristics can be achieved, due to ideal steep flanks and highest aspect ratios.

Precision optical assembly in fully automated production cells
Tobias Müller

For serial and mass production the assembly of micro systems requires automated handling devices and alignment methods. The Fraunhofer IPT has developed a flexible assembly cell based on exchangeable platform units with which the overall system can be customized for any specific application. Utilizing industry proven grippers, dispensers and measurement equipment etc. assembly processes can run autonomously for many hours and days, delivering high quality optical systems in a very efficient manner.

Wavefront-based alignment of complex optical system
Reik Krappig

he wavefront of optical systems depends on the refractive index of the material, the geometrical properties of the surfaces and the position of the elements within the system. If the first 2 factors are known, the wavefront can be used in order to perform alignment processes with high efficiency and precision. Compared to conventional alignment methods all degrees of freedom of all relevant elements are calculated and corrected in only one measurement.

12.00 hrs


EUV metrology / lithography
Lukas Bahrenberg

In fabrication and metrology of nanoscale structures, EUV radiation exhibits high potential due to a strong light-material interaction and its short wavelength. Using an EUV proximity lithography approach, that is based on achromatic Talbot lithography, structure sizes below 30 nm half-pitch have been produced in a lab-based lithography setup. In another setup, EUV reflectance of nanoscale structures is measured, which enables the detection of sub-nm thin layers and sub-nm small layer thickness variations in semiconductor thin film systems.

EUV sources
Klaus Bergmann

The next generation lithography for future chip production (EUV Lithography) requires new and powerful sources at a wavelength of 13.5 nm. Fraunhofer ILT is developing discharge based light sources which are mainly used for metrology applications in the EUVL development. Examples are optics characterization, defect inspection on masks or to provide light for optics contamination studies. The generation of a dense and hot plasmas using a high pulsed current as efficient emitter in the extreme ultraviolet is presented.

Laser based production of optical components (ablation, polishing and form correction)
Karsten Braun

The mechanical production of aspheres and freeform optics is a challenging topic. Although high-quality optics can be made it is expensive and time-consuming. Therefor the Fraunhofer ILT is developing a completely laser based process chain for the manufacturing of freeform optics. This process chain consists of three basics steps: 1) By selectively ablating surface material the form is generated. 2) The resulting surface roughness is reduced by remelting the surface. 3) The details of the surface are corrected with the “laser beam figuring”-process.

Self optimizing assembly of optical system
Martin Holters

Presented is a mobile assembly cell for optical systems utilizing a model based approach. This enables a function oriented and fully automated assembly process for optical systems. The hereby works with a multi-agent system to enable a fast change of hardware setups or software and model setups. In addition a digital twin of the produced optical system will be generated during the assembly process.

Heinrich Faidel

For the development of new opto-thermo-mechanical stable laser systems appropriate test facilities and procedures are required. Fraunhofer ILT is able to cover the full range of the activities regarding the qualification of rugged optical systems. Starting with simulations and analyses to testing and documentation. Within the scope of optics week in Aachen Fraunhofer ILT will provide an insight into the environmental test facility including climate chamber and vibration test equipment.

Manufacturing of optical components by inverse laser drilling
Dominik Esser

Inverse Laser Drilling allows for structuring high aspect ratio geometries into dielectric materials by means of laser radiation. Thus this method is well suited for drilling small openings into glass substrates which enables the fabrication of special optical components like spatial filtres, interleaving mirrors for geometric separation or coupling of ray bundles and even preforms for photonic crystal fibres. Due to a patented feature mirror substrates can be machined without chipping or otherwise affecting the surrounding surface.

15.00 hrs

Transfer to Photonic Cluster

15.15 hrs

Research Campus Digital Photonic Production
Christian Hinke

16.00 hrs

End of Demonstration Day